Interface Engineering for Steep Slope Cryogenic MOSFETs

Richstein, B.; Han, Y.; Zhao, Q.; Hellmich, L.; Klos, J.; Scholz, S.; Schreiber, Lars R.; Knoch, J.

New York, NY : IEEE (2022)
Journal Article

In: IEEE electron device letters
Volume: 43
Issue: 12
Page(s)/Article-Nr.: 2149-2152